Ultrapure water containing dissolved ozone is being increasingly considered for providing contamination-free environment required for advanced wet chemical processing of wafers. Fluoropolymers, including polyvinylidene fluoride, have become industry standard materials for the construction of piping and components used in the distribution of ozonated ultrahigh-purity water for the semiconductor industry. In order to determine the chemical stability of polyvinylidene fluoride in the presence of dissolved ozone, we used a number of complementary analytical techniques : scanning electron microscopy with energy dispersive spectroscopy, angle-resolved x-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectroscopy, and ion sputtering for chemical characterization of the polyvinylidene fluoride pipe surface. Both qualitative and quantitative information obtained from these analyses revealed a loss of fluorine with minor surface oxidation. This was found to be limited to several monolayers near the surface of the ozone-treated polyvinyldiene fluoride pipe. The loss of fluorine is explained via a dehydrofluorination mechanism which normally initiates via free radicals produced by interaction of ozone with polyvinylidene fluoride. Implications of such surface reactions for wet chemical cleaning of wafers for the semiconductor industry are discussed.