Journal of the Electrochemical Society, Vol.145, No.5, 1715-1719, 1998
Quantitative evaluation of precipitated oxygen in silicon by infrared spectroscopy - Still an open problem
A critical analysis of the use bf infrared spectroscopy to obtain a quantitative evaluation of precipitated oxygen in silicon is presented. Precipitates were detected and studied either indirectly or directly. It is shown that, in both cases, there are some limitations in the reliability of the results, so that a quantitative evaluation of the amount of precipitated oxygen is rarely achievable.