화학공학소재연구정보센터
Journal of the Electrochemical Society, Vol.145, No.6, 1812-1818, 1998
Deposition of silica films using electrochemical procedures
A process whereby a thin surface layer of SiO2 can be electrochemically deposited on a metallic substrate is described. The process has been termed silicadizing and utilizes K2SiO3 electrolyte at pH 11-13 with additions of K2O, Na2O2, and CH3COOH. The metal to be coated is the anode, and direct current voltages up to 350 V at low currents are used. Preliminary tests indicate that various types of silicadized coatings can be produced depending upon possible applications. The coatings can be used as a preparatory adhesive surface for painting of aluminum alloys or as a decorative surface by itself. Initial tests indicate that the silicadized surface layer is both wear resistant and corrosion resistant.