F 농도 조절을 통한 AZO 박막의 광학적 전기적 특성 향상

장수영; 장준성; 조은애; Vijay Chandraknt Karade; 김지훈; 문종하; 김진혁; Suyoung Jang; Jun Sung Jang; Eunae Jo; Vijay Chandraknt Karade; Jihun Kim; Jong-Ha Moon; Jin Hyeok Kim

Korean Journal of Materials Research, Vol.31, No.3, 150-155, March, 2021

DOI10.3740/MRSK.2021.31.3.150 Export Citation

F 농도 조절을 통한 AZO 박막의 광학적 전기적 특성 향상

Improvement of Optical and Electrical Properties of AZO Thin Films by Controlling Fluorine Concentration

장수영¹, 장준성¹, 조은애¹, Vijay Chandraknt Karade¹, 김지훈², 문종하¹, 김진혁^{1, 3, †}

¹전남대학교 신소재공학과
²광주과학기술원 전기전자컴퓨터공학부
³전남대학교 광전자융합기술연구소

Suyoung Jang¹, Jun Sung Jang¹, Eunae Jo¹, Vijay Chandraknt Karade¹, Jihun Kim², Jong-Ha Moon¹, and Jin Hyeok Kim^{1, 3, †}

¹Department of Materials Science and Engineering, Chonnam National University, 77 Youngbong-ro, Buk-Gu, Gwangju 61186, Republic of Korea
²School of Integrated Technology, Gwangju Institute of Science and Technology, 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, Republic of Korea
³Optoelectronics Convergence Research Center, Chonnam National University, 77 Youngbong-ro, Buk-Gu, Gwangju 61186, Republic of Korea

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Zinc oxide (ZnO) based transparent conducting oxides (TCO) thin films, are used in many applications such as solar cells, flat panel displays, and LEDs due to their wide bandgap nature and excellent electrical properties. In the present work, fluorine and aluminium-doped ZnO targets are prepared and thin films are deposited on soda-lime glass substrate using a RF magnetron sputtering unit. The aluminium concentration is fixed at 2 wt%, and the fluorine concentration is adjusted between 0 to 2.0 wt% with five different concentrations, namely, Al2ZnO98(AZO), F0.5AZO97.5(FAZO1), F1AZO97(FAZO2), F1.5AZO96.5(FAZO3), and F2AZO96(FAZO4). Thin films are deposited with an RF power of 40 W and working pressure of 5 m Torr at 270 °C. The morphological analysis performed for the thin film reveals that surface roughness decreases in FAZO1 and FAZO2 samples when doped with a small amount of fluorine. Further, optical and electrical properties measured for FAZO1 sample show average optical transmissions of over 89 % in the visible region and 82.5 % in the infrared region, followed by low resistivity and sheet resistance of 3.59 × 10-4 Ωcm and 5.52 Ω/sq, respectively. In future, these thin films with excellent optoelectronic properties can be used for thin-film solar cell and other optoelectronics applications.

Keywords:solar cells;thin films;transparent conducting electrode;F;Al co-doped ZnO (FAZO)

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[1] Afre RA, Sharma N, Sharon M, Sharon M, Rev. Adv. Mater. Sci., 53, 79 (2018)

[2] Kerkache L, Layadi A, Mosser A, J. Alloy. Compd., 485, 46 (2009)

[3] Wang FH, Chang CL, Appl. Surf. Sci., 370, 83 (2016)

[4] Minami T, Semicond. Sci. Technol., 20, S35 (2005)

[5] Lu S, Sun Y, Ren K, Liu K, Wang Z, Qu S, Polymers, 10, 5 (2018)

[6] Challali F, Mendil D, Touam T, Chauveau T, Bockelee V, Sanchez AG, Chelouche A, Besland MP, Mater. Sci. Semicond. Process, 118, 105217 (2020)

[7] Ellmer K, Nat. Photonics, 6, 809 (2012)

[8] Kim I, Lee KS, Lee TS, Jeong JH, Cheong BK, Baik YJ, Kim WM, J. Appl. Phys., 100, 063701 (2006)

[9] Ma J, Zhang W, Lin J, Sun Y, Ma J, Xu H, Liu Y, Yang G, J. Alloy. Compd., 819, 153012 (2020)

[10] Kumar KDA, Valanarasu S, Kathalingam A, Ganesh V, Shkir M, Faify S, Appl. Phys. A-Mater. Sci. Process., 123, 801 (2017)

[11] Purica M, Budianu E, Rusu E, Danila M, Gavrila R, Thin Solid Films, 403-404, 485 (2002)

[12] Ryu YR, Zhu S, J. Appl. Phys., 88, 201 (2000)

[13] Krunks M, Mellikov E, Thin Solid Films, 270(1-2), 33 (1995)

[14] Ellmer K, J. Phys. D-Appl. Phys., 33, R17 (2000)

[15] Li Q, Zhu L, Li Y, Zhang X, Niu W, Guo Y, Ye Z, J. Alloy. Compd., 697, 156 (2017)

[16] Meng X, Zhang H, Zhang X, Zheng G, Xie X, Han B, Yang F, Pei H, Wang Y, Optik, 219, 165105 (2020)

[17] Lu JG, Fujita S, J. Appl. Phys., 101, 083705 (2007)

[18] Tauc J, Grigorovici R, Vancu A, Phys. Status Solidi, 15, 627 (1966)

[19] Tuan TTA, Kuo DH, Lin K, Li GZ, Thin Solid Films, 589, 182 (2015)

[20] Haacke G, J. Appl. Phys., 47, 4086 (1976)