Journal of Vacuum Science & Technology A, Vol.13, No.2, 314-326, 1995
Thermal Relaxation Kinetics of Strained Si/Si1-xGex Heterostructures Determined by Direct Measurement of Mosaicity and Lattice-Parameter Variations
Keywords:CRITICAL-LAYER-THICKNESS;X-RAY-DIFFRACTION;MOLECULAR-BEAM EPITAXY;SI1-XGEX/SI HETEROSTRUCTURES;MISFIT DISLOCATIONS;MULTILAYERS;DEFECTS;SUPERLATTICES;DIFFUSION;ALLOYS