Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 753-757, 1995 DOI10.1116/1.579821 Export Citation Nanoscale Structures in III-V Semiconductors Using Sidewall Masking and High Ion Density Dry-Etching Ren F, Pearton SJ, Abernathy CR, Lothian JR Keywords:MOLECULAR-BEAM EPITAXY;QUANTUM-WELL WIRES;THRESHOLD CURRENT;LASERS;GROWTH;INN Please enable JavaScript to view the comments powered by Disqus.
