Journal of Vacuum Science & Technology A, Vol.13, No.3, 820-825, 1995
Plasma-Enhanced Chemical-Vapor-Deposition of Silicon, Germanium, and Tin Nitride Thin-Films from Metalorganic Precursors
Keywords:LOW-TEMPERATURE;ELECTRICAL-PROPERTIES;OPTICAL-PROPERTIES;CVD;PRESSURE;SEMICONDUCTOR;ABSORPTION;KINETICS;AMMONIA