Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 943-947, 1995 DOI10.1116/1.579655 Export Citation Identification of Plasma-Induced Failure Modes in the Development of a Bipolar-Complementary Metal-Oxide-Semiconductor Process Hackenberg JJ, Dion MJ, Hemmenway DF, Pearce LG, Werner JW Please enable JavaScript to view the comments powered by Disqus.
