Sequential ion implantation of indium and phosphorus into silica combined with controlled thermal annealing has proven to be a novel and effective technique to fabricate InP quantum dots in dielectric hosts. This technique has been applied to synthesize other III-V and II-VI quantum dots. Due to the unique bimodal distribution of the indium in a silica host and a stoichiometric mismatch between the indium and phosphorus concentration profiles, it is believed that two different-sized InP quantum dots were fabricated. More importantly, we have shown that the infrared reflectance technique is a very effective method to identify the species in the dielectric host and is also a powerful tool to investigate surface phonon modes.