A model for a large area multifrequency multiplanar coil inductively coupled plasma (ICP) source is presented. Typical ICP sources employ a single coil that is engineered to provide optimum plasma uniformity for large area processing. Pulsed sources have also been developed to improve etch selectivity via increased radical generation and lower net ion densities. The source described here potentially achieves a combined pulsed mode and the capability of moving the plasma source from inner to outer radii in a controlled fashion (raster mode) for very large area applications. The model consists of a coupled steady-state two-dimensional ambipolar diffusion model, an electromagnetics model, and a lumped parameter circuit model. While stable operation is possible, the model shows that the scheme is found to be very sensitive to coil-to-coil coupling and to the ordering of the phases and frequencies of the coils. Examples of stable operation of a three coil set device are presented : Results suggest that frequency control may be an attractive control variable for real time control of large area plasma processes.