Plasma source ion implantation (PSII) is a relatively simple technique for the ion implantation/deposition of materials. In PSII a substrate is immersed in a plasma, and high negative voltage pulses are applied to accelerate ions into the substrate resulting in modification of the properties of the material in the near surface region. A technique was developed to produce uniform diamondlike carbon coatings and TiNx films inside and outside a hollow cylinder (substrate). A description of apparatus, experimental methods for this type of deposition process, and preliminary results are presented in this article.