Low-temperature (< 450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997)

Wolfe DM; Wang F; Habermehl S; Lucovsky G

Journal of Vacuum Science & Technology A, Vol.16, No.1, 207-207, 1998

Wolfe DM, Wang F, Habermehl S, Lucovsky G

Keywords:CHEMICAL-VAPOR-DEPOSITION;REMOTE