화학공학소재연구정보센터
Journal of Vacuum Science & Technology A, Vol.16, No.6, 3301-3304, 1998
Formation of nanocrystalline NiCr-N films by reactive dc magnetron sputtering
The article reports on structure and hardness of NiCr-N films prepared by de reactive magnetron sputtering of NiCr (80/20 wt. %) target in a mixture of Ar and N-2 On glass and 15 330 steel substrates at room temperature using a round planar magnetron of diameter 75 mm : It was found that while pure NiCr films are polycrystalline, an addition of nitrogen into the film reduces a grain size d and makes it possible to form nanocrystalline NiCr-N films. The hardness HV of the NiCr-N film increases with decreasing grain size d but only down to about 7 nm. For grains smaller than 7 nm the hardness HV decreases.