In this study, the distribution of argon sputtering rate on the cathode surface was used to investigate the anode magnetron torch plasma system: which was developed fnr large substrate surface treatment. The Ar sputtering rate was estimated using the colorimetric method. The experimental results showed that a uniform sputtering rate could be achieved by adjusting the distance between the two electrodes, because a suitable electrode distance creates a uniform magnetic field near the cathode surface. A small gap distance can increase the Ar sputtering rate in the focused area, but also creates deposition near the vicinity or outside of the edge of the glass tube, which is used to focus the gas flow. The optimum gap distance is equal to the cathodic dark space thickness at the edge of the glass tube; this configuration maintains a high sputtering rate in the focused area, but does not allow deposition to occur near the vicinity or outside of the edge of the glass tube. A higher Ar sputtering rate can be achieved under low system pressure. At low system pressure, a high magnetic-field strength is important for increasing the Ar sputtering rate, as it improves the magnetic confinement of electrons.