화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.12, No.2, 1050-1052, 1994
Effects of As4 Flux on Reflection High-Energy Electron-Diffraction Oscillations During Growth of GaAs at Low-Temperatures
This article reports on the observation of reflection high-energy electron diffraction oscillations during growth of GaAs by molecular beam epitaxy at temperatures as low as 60-degrees-C. At low temperatures (<300-degrees-C), the amplitude of the oscillations is shown to be sensitive to the As:Ga flux ratio. The largest amplitude oscillations are observed under stoichiometric conditions.