Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3900-3904, 1994 DOI10.1116/1.587571 Export Citation Modeling and Simulations of a Positive Chemically Amplified Photoresist for X-Ray-Lithography Krasnoperova AA, Khan M, Rhyner S, Taylor JW, Zhu Y, Cerrina F Keywords:RESIST Please enable JavaScript to view the comments powered by Disqus.
