Self-assembled monolayers made from long chain hydrocarbon trichlorosilanes have been used previously as very thin self-developing resists, ideal for electron-beam lithography. We are currently studying the physical and chemical effects of additional functional groups at the monolayer terminus by varying the electron-beam dose and etching procedures for the fluorinated trichlorosilanes. These monolayers are attractive candidates for ultrathin electron-beam resists because they are typically inert towards concentrated alkalis and acids thereby making them resistant to chemical attack. These materials can be used as positive resists on oxide surfaces at various electron-beam energies and doses. A wet chemical etch is used to transfer exposed patterns to substrates.