We have demonstrated that nanometer-scale gold dots can be deposited on a vicinal Si(111) 7 x 7 surface using the field-assisted atom transfer from the gold-coated tungsten tip of a scanning tunneling microscope operating in ultrahigh vacuum. With the application of negative voltage pulses to the tip, gold nano-mounds with the size ranging from similar to 3 to similar to 20 nm across at the base and 0.6-1 nm high can be created on the surface. The deposition is found to be more favored on the step edges than the (111) terraces. Since atomically resolved images of the Si(111) 7 x 7 structure can be observed even after many cycles of atom transfer using the gold-coated tip, the shape of the tip apex has been kept very stable. The overall findings clearly suggest that the atom-transfer technique proposed here is proven to be a good candidate for fabricating nanometer-scale devices.