We report the application of direct aerial image monitoring to measure the performance of an extreme ultraviolet lithography (EUVL) test bed. There are several issues which might limit the possibility of performing image monitoring experiments on EUVL systems. These issues include : source flux, signal-to-noise ratios, and EUV scanning aperture fabrication. We report the results of initial aerial image scans of equal lines and spaces as well as preliminary measurements of scatter produced by the EUV camera.