The fabrication of microlenses using a dry resist process is described for the first time. Characteristics of the totally dry process were investigated. A technique for lens positioning and exposure was developed for a scanning electron microscope equipped with an image processor beam control system. The microlenses have a computer generated hyperbolic profile. Microlenses of cylindrical, ring, and elliptical geometry were fabricated on a Si wafer and on the end of a monomode quartz fiber. Focusing of visible and infrared light by a fabricated microlens is demonstrated.