Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.15, No.5, 1843-1846, 1997 DOI10.1116/1.589337 Export Citation Low-Temperature Plasma-Enhanced Chemical-Vapor-Deposition of Fluorinated Silicon-Oxide Films as an Interlayer Dielectric Song JH, Ajmera PK, Lee GS Keywords:NITROUS-OXIDE;CONSTANT;DISILANE Please enable JavaScript to view the comments powered by Disqus.
