화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.16, No.1, 142-146, 1998
Temperature dependence of conductivity and Hall carrier concentration of polycrystalline SiC deposited on fused silica by laser ablation
The conductivity and Hall coefficient of polycrystalline SiC films deposited on quartz are studied in the temperature ranges of 13-1275 K and 17-800 K, respectively. Since conductivities were monotonically increasing with the increasing temperature, these films can be used as thermistors over the entire temperature range, While Hall mobility shows a weak temperature dependence, the electron concentration, as computed from n=1/qR(H), increases exponentially with temperature from 10(19) to 4x10(20) cm(-3). Three well-separated activation energies, computed from the measured conductivity and Hall concentration, are in the ranges of 0.4-3.8 meV, 7-20 meV, and 55.5 +/-5 meV. Due to high electron concentration measured at temperatures as low as 17 It, impurity/defect related conduction or thermally activated hopping may be dominant at low temperatures.