Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.16, No.3, 1255-1257, 1998 DOI10.1116/1.589996 Export Citation Electron beam lithography of nanostructures using 2-propanol : water and 2-propanol : methyl isobutyl ketone as developers for poly-methylmethacrylate Lavallee E, Beauvais J, Beerens J Keywords:RESIST Please enable JavaScript to view the comments powered by Disqus.
