An approach for nanofabrication using de Broglie wave has been developed. Line and dot patterns with 100-nm periodicity were delineated on a PMMA resist by electron-beam holography with a thermal field-emitter gun and an electron biprism. This technique allows us to produce nanoscale periodic patterns simultaneously. Furthermore, the possibility of nanostructure fabrication by atomic-beam holography has been demonstrated by using a laser-trap technique and a computer-generated hologram made by electron-beam lithography.