This article focuses on some fabrication issues-and characterization at various steps of the LIGA [German acronym for Lithorgraphy, Galvanoplasty, and molding (Abformung)] process, in particular on the acuity of pattern transfer through the various steps of the process, from the optical mask to planarized electroplated parts for basic LIGA processing (single level). Metrology data on the accuracy of the LIGA process as currently applied in the high-aspect-ratio microelectromechanical systems (HI-MEMS) Alliance at various stages of the process are presented and the sources of process biases are investigated. Some potential areas for improvement with respect to dimensional control will also be highlighted.