A new plasma-based ion implantation (PBII) facility consisting of a dedicated PBII chamber plus characterization equipment has been established at the Van de Graaff Group, National Accelerator Centre, Faure. The implantation unit has an aluminum vacuum chamber with a volume of 1 m(3), and it incorporates conventional plasma generation capability for gas plasmas, such as a set of multifilaments. The implantation power supply is capable of delivering 30 kV, With a pulse duration of up to 1000 mu s, and a repetition rate of 1 kHz. This allows a maximum average load of 12 J to the target. The facility is being used at the outset for the fundamental study of plasmas, time-dependent x-ray generation during the implantation pulse, and plasma immersion implantation. The facility is supported by a 6 MV Van;de Graaff accelerator equipped with the ion-beam analytical tools necessary for characterization of modified surfaces.