The texture of Ti films sputter deposited at 350 degrees C on water-immersed borophosphosilicate glass (BPSG) films were investigated as a function of the boron content and immersion time of the BPSG films. The Ti film texture was the most strongly (002) preferred for the BPSG films that absorbed a certain amount of water, regardless of their boron content and immersion time. The following mechanism is proposed for the improved texture. The water-absorbed BPSG films increase H2O partial pressure near the BPSG surface during the heating up to 350 degrees C prior to Ti sputtering; the increased H2O pressure increases the density of silanol groups on the BPSG surface to reduce surface free energy; this results in Ti film growth toward highly preferred (002) texture by self-assembly of Ti atoms.