Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.17, No.5, 2191-2192, 1999 DOI10.1116/1.590891 Export Citation Determination of silicon oxide layer thickness by time-of-flight secondary ion mass spectroscopy Brox O, Iltgen K, Hellweg S, Benninghoven A Please enable JavaScript to view the comments powered by Disqus.
