Langmuir, Vol.12, No.17, 4205-4210, 1996
CF4 Glow-Discharge Modification of CH4 Plasma Polymer Layers Deposited Onto Asymmetric Polysulfone Gas Separation Membranes
Post CF4 glow discharge modification of methane plasma polymer layers deposited onto asymmetric polysulfone membranes has been investigated by XPS, FTIR, AFM, and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity through the polysulfone substrate are found to be strongly influenced by the plasma processing parameters.
Keywords:ATOMIC-FORCE MICROSCOPY;AMORPHOUS-CARBON FILMS;ISOTACTIC POLYPROPYLENE;SURFACE MODIFICATION;METHANE;MORPHOLOGY;FREQUENCY;MIXTURES;DYNAMICS;BEHAVIOR