Previous Article Next Article Table of Contents Langmuir, Vol.14, No.10, 2925-2928, 1998 DOI10.1021/la9711950 Export Citation Contact angle, gas bubble detachment, and surface roughness in the anisotropic dissolution of Si(100) in aqueous KOH Baum T, Satherley J, Schiffrin DJ Keywords:INTERFACIAL-TENSION;SILICON;WATER;PASSIVATION Please enable JavaScript to view the comments powered by Disqus.
