화학공학소재연구정보센터
Materials Research Bulletin, Vol.30, No.9, 1081-1088, 1995
Effect of KrF Excimer-Laser Irradiation on Low-Temperature Preparation of Lead Titanium-Oxide Film by Metalorganic Chemical-Vapor-Deposition
Effect of KrF excimer laser irradiation on the preparation of PbTiO3 film by metalorganic chemical vapor deposition(MOCVD) was studied from the view points of composition, deposition amount, crystallinity and the morphology of the film. The crystalline PbTiO3 films with stoichiometric composition was prepared at 380 degrees C with the irradiation of KrF excimer laser (248nm) using Pb(DPM)(2) and Ti(O . i-Pr)(4) as the MOCVD gas source. On the other hand, the film without irradiation had the Pb-poor composition and was amorphous. The deposition amount of irradiated film was 1.5 times as high as that of non-irradiated film. It was supposed that this was not due to the heat effect with irradiation, but due to the photochemical effect.