A novel method is reported for the preparation of carbon films under ambient conditions of pressure and temperature. The substrate is surrounded by a gas mixture containing 10% carbon dioxide in nitrogen. A pulsed carbon dioxide laser is used to trigger the discharge of a capacitor, for producing a pulse of plasma in the gas mixture, and to superficially heat the substrate at the same time. The carbon film has been characterized by scanning electron microscopy (SEM), X-ray photoelectron spectrosopy (XPS),and Raman spectroscopy.