화학공학소재연구정보센터
Particulate Science and Technology, Vol.15, No.3, 371-383, 1997
Electrostatic deposition of large grained polycrystalline silicon films for solar cell applications
Large grained (> 50 mu m < 100 mu m) polycrystalline silicon films have been formed using a patented electrostatic deposition method which utilizes charged particle motion in an electric field. After deposition, the films are heat treated at varying times and temperatures in a programmable furnace maintained under a purified argon atmosphere. Solar cells were fabricated using these large grained polycrystalline silicon films by sputtering pure gold as back contacts and using high quality silver paint as front contacts. The cells have shown efficiencies of 1.8% indicating that great potential exists for significant improvement.