A series of diblock copolymers, poly (tert-butyl styrene)-sodium poly (styrene sulfonate) with different molecular weight and percentage of sulfonation have been used to study the effect of polymer structure on its adsorption behavior onto hydrophobically modified silicon wafers. The percentage of the hydrophobic block varies from 3.6-8.9%. Previous studies show that salt concentration is very important for the adsorption of such polyelectrolytes onto silica surfaces. Octadecyltriethoxysilane (OTE) has been used to modify the silicon wafer which changes the water contact angle from 50 degrees on unmodified silica to 100 degrees to 120 degrees. On this hydrophobic surface, we found that the adsorption of these slightly hydrophobically modified polyelectrolytes is close to the 4/23rd power of salt concentration predicted by a recent model. The grafting density is also consistent with a dependence on the length of the hydrophobic block to the -12/23rd power, and the length of the polyelectrolyte block to the -6/23rd power, predicted by this model.