This paper proposes a new advanced fabrication technology for a low-cost integrated-type a-Si solar cell. Integrated-type cells provide many advantages and have been industrialized with a laser patterning method. However, a higher throughput and more efficient patterning method was required for applying a-Si solar cells to a power generating system. Plasma CVM (Chemical Vaporization Machining) was first applied to advanced patterning because of its advantages of high speed and selectivity. In this method, a plasma generated under high pressure localizes near the wire electrode and concentrates reactive radicals. As a result, we achieved an etching rate of more than 1 mu m/s and selective patterning of a 200 mu m-wide a-Si layer in 1 s multiline patterning was also developed for large-area modules.