Films of polycrystalline n-CdSe were prepared onto Ti substrates by cathodic deposition in a bath containing CdSO4, H2SeO3, and H2SO4, with the aim of obtaining efficient photoelectrodes in a photoelectrochemical cell. Preparation procedures were evaluated, both with regard to the problem of obtaining reproducible results, and to optimization of electrode performance. A number of factors were studied, including preparation of the surface of the Ti and of the Cd electrodes prior to deposition, composition of the plating solution: current density, stirring, time of deposition, post-deposition heat treatment, and electrode etching.