As-deposited thin-film materials for rechargeable lithium batteries prepared by r.f.-sputtering have been studied. Thin-film electrolytes and thin buffer layers were sputtered by using LI(3)PO(4) and LiBO2 and Li2ZrO3 targets, respectively. Thin negative electrode films were prepared from C and Li4Fe0.5Ti4.5O11.75 targets. Reactive sputtering of W and Mo metal in Ar+O-2 atmospheres was applied to obtain WO2 and MoO2 thin films. LiCoO2 and LiMn2O4 targets were employed for the fabrication of thin positive electrode layers. Various observations are described. In the case of LiPON, which is made by sputtering Li3PO4 reactively in N-2, new results concerning its chemical stability have been obtained. The electrolyte films were investigated by impedance analysis. To characterize the electrode layers, the chemical diffusion coefficient was determined by GITT. Charge-discharge curves of a thin-him battery prepared by sputtering from Mo (top current collector), Li4Fe0.5Ti4.5O11.75, (negative electrode), LIBO(2) (electrolyte), LiCoO2 (positive electrode) and Pt/Rh-90/10 wt.% (bottom current collector) targets are presented.