SrTiO3 thin films were prepared at very low temperature (<200 degrees C) by a simple chemical process. The precursor solution was prepared in methoxy ethanol starting from strontium hydroxide and titanium isopropoxide. Using this solution, thin films were deposited by spin coating on different substrates. X-ray diffraction of the as-dried films as well as the powders obtained by evaporating the solution confirmed the formation of stoichiometric crystalline SrTiO3 material at these low temperatures. The sheet resistance of the films was measured and found to be 10(14) Ohm square(-1) for a 1 mu m thickness. The initial results on these films suggest their suitability as barrier layers in MIS and SIS devices.