Thin Solid Films, Vol.240, No.1-2, 56-59, 1994
Random Stacking in MoS2-X Sputtered Thin-Films
The structure of sputter-deposited MoS2-x films is investigated by X-ray and electron diffraction. The diffraction spectra show important differences with respect to those of known molybdenite phases. These differences are interpreted in terms of the random-layer model usually applied to turbostratic carbon. Peak profile calculations are performed following an extension of Wilson’s model, taking into account the structure factor. They show that the crystal structure of these films consists in a random stacking of S-Mo-S layers, without evidence of 2H or 3R polytypism.
Keywords:DEPOSITION