Our investigations concentrated on the deposition of oxide films for optical applications, particularly HfO2, Y2O3 and ZrO2, by means of pulsed laser ablation at a wavelength of 248 nm. To improve their stoichiometry as well as their structural and optical properties, the films were grown in an oxygen atmosphere or were bombarded with oxygen ions during the deposition process. Using this technique, smooth films of HfO2, Y2O3 and ZrO2 could be deposited. Stoichiometric films of HfO2 were only obtained with simultaneous oxygen ion bombardment. Concurrent with the improved stoichiometry the optical parameters, refractive index and absorption coefficient, decreased. Unlike HfO2 films, Y2O3 and ZrO2 films of good optical quality were prepared in an oxygen atmosphere without additional ion bombardment.