In the present study the properties of ion-plated titanium films have been investigated for their structure and microstructure. It has been found that the crystalline orientation of the films is a strong function of process parameters such as the rate of deposition, ion flux and bias voltage. The stress exhibits a transition from tensile to compressive with increase in ion bombardment. It has also been found that the lattice parameter increases initially and then decreases with increase in ion bombardment. Finally, the microstructure of the films shows that they densify with increase in ion bombardment. A correlation between the mechanisms governing the process and the film properties has also been made.