We used Monte Carlo simulations (MCS) to study the transport of ions through single and dual frequency, multicomponent plasma sheaths during plasma enhanced deposition of silicon dioxide from TEOS and oxygen mixtures (PETEOS). First, we used our dual frequency plasma sheath model (DFPSM) to predict the potential as a function of position and time and the sheath thickness as a function of time. We then performed the Monte Carlo simulations to determine the angular and energy distribution functions for a selected species striking the substrate, taking into account a variety of collision types. Our DFPSM predictions as well as our distribution function predictions are in reasonable agreement with most available experimental data. There is little experimental information available with which to compare our multicomponent and dual frequency predictions; however, the trends observed are consistent with explanations often used to interpret trends in film properties.