TiNx films with various x values were prepared by ion beam-assisted deposition. The composition and structure of the films were investigated by Rutherford backscattering spectroscopy and X-ray diffraction (XRD). The results of XRD indicated that the films consisted of free alpha-Ti when x was less than 0.5. delta-TiNx films were formed when x was larger than 0.5. At critical value of x = 0.5, an amorphous film was obtained. For the delta-TiNx films, it was observed that the films had preferred orientation. The preferred orientation of the films changed from [111] to [100] with ion current density.