Optically transparent, conducting CuI films have been prepared by a magnetron sputtering technique which employs rf and dc target biases. It is shown that the stoichiometric CuI films are obtained at the target bias V-T=-200 V, while the lowest resistivity of 5.4X10(-2) Ohm cm and the best optical transmittance of about 70% over the wavelength range 500 to 1000 nm are obtained at V-T=-50 V where the I/Cu ratio is 0.9.