Bi2Sr2CanCun+1Oy (n greater than or equal to 0; BSCCO) thin film is fabricated via two different processes using an ion beam sputtering method i.e. codeposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process, while it cannot be obtained by the layer-by-layer process. Ultra-low growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.