VOx thin films were fabricated by the reactive e-beam evaporation method. By varying oxygen pressure during reactive e-beam evaporation, the stoichiometry of vanadium dioxide thin film was changed. The oxygen pressure of 5 x 10(-5) Torr was found to be an optimum pressure to fabricate perfect stoichiometric VO2 thin film. Any deviation from perfect stoichiometry tended to degrade the thermochromic effect of the film. Rapid thermal annealing (RTA) was successfully adopted to crystallize the VO2 thin films. An RTA temperature of 400 degrees C similar to 450 degrees C and an RTA time of 30 s were found to provide the optimum conditions for the VO2 thin film to exhibit a distinct thermochromism.