화학공학소재연구정보센터
Thin Solid Films, Vol.295, No.1-2, 16-18, 1997
Effect of the Substrate on the Growth of Spinel Iron-Oxide Thin-Films by Metal-Organic Chemical-Vapor-Deposition
Iron oxide thin films were deposited onto various substrates under various O-2 how rates by metal-organic chemical vapor deposition. Spinel Fe3O4+x was formed at lower O-2 flow rates on all substrates. However, at higher O-2 how rates, a mixture of beta-Fe2O3 and spinel Fe3O2+x was formed on a non-alkaline glass and the (100) plane of SiTiO3 single-crystal substrates, and highly (100) oriented spinel Fe3O4+x was formed on (100) MgO single crystals and on (100) oriented MgO buffer layers. Mainly (311) oriented spinel Fe3O4+x was formed on (111) oriented MgO buffer layers. The experimental results are discussed with respect to the lattice mismatch between spinel Fe3O4+x and the substrates.