A novel technique to form free patterns of multicolor images an a semitransparent electrode is proposed. The technique is based on the combination of an electrolytic micelle disruption method and a photoelectrochemical process on a semiconducting ZnO electrode with a wide bandgap, and is called the photoelectrolytic micelle disruption (PMD) method. Area-selective illumination of the ZnO semiconductor with ultraviolet (u.v.) light leads to the formation of desired patterns of images made of red, green or blue organic pigments. Thickness of a pigment film can be controlled by an illumination time at a fixed intensity of light or by light intensity at a fixed illumination period. The latter feature of the PMD method enables formation of a graded color image by illuminating the ZnO electrode with u.v. light with a different intensity at different positions of a projected area. Modifications of the PMD method, utilizing photodissolution of ZnO, are described together with a version which does not require an external bias. The preparation of ZnO layers using ultrasonic spray pyrolysis is also described.