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Thin Solid Films, Vol.301, No.1-2, 249-252, 1997
Logarithmic Dependence of the Surface Anisotropy on the Low-Angle X-Ray-Diffraction Intensity in Co-Based Multilayers
We have investigated the dependence of the surface anisotropy on the interfacial microstructure in Co/Pd and Co/Pt multilayers prepared by sputtering. The interfacial microstructure of multilayers was manipulated by changing sputtering Ar gas pressure in the preparation of samples. The surface anisotropy of Co/Pd and Co/Pt multilayers was sensitively dependent on the interfacial microstructural modification and the surface anisotropy of those multilayers was found to be logarithmically dependent on the integrated low-angle X-ray diffraction intensity.