Ti films were deposited on liquid nitrogen-cooled substrates by ion-beam sputtering. The X-ray diffraction pattern of the as-deposited Ti films clearly shows Ti amorphous diffused scattering maxima. The image of the Ti films was observed by high-resolution electron microscopy and the electron diffraction pattern of the film demonstrates again the amorphous structure by its diffused halo. Energy dispersive analysis of X-ray and Auger depth profiling were used to examine the ingredients of the film. The results show that the film can be considered as Ti amorphous film.